AlGaN/GaN Heterostructure Field-Effect Transistors (HFETs) Model Including Impact Ionization Rates

dc.contributor.authorSayah, Cen_US
dc.contributor.authorBouazza, Ben_US
dc.contributor.authorGuen Bouazza, Aen_US
dc.contributor.authorChabane Saria, N Een_US
dc.date.accessioned2013-03-19T09:07:11Zen_US
dc.date.available2013-03-19T09:07:11Zen_US
dc.date.issued2012-02en_US
dc.descriptionWorld Applied Programming, Vol (2), No (2), February 2012. 104-109.en_US
dc.description.abstractHot carrier effects in semiconductors are crucial phenomena or electron devices, since they play an important role in the device. One of the most powerful tools to describe hot carrier effects is ensemble Monte Carlo (EMC) simulation. This article reports the development and application of a Two-dimensional selfconsistent Monte Carlo simulator for electron transport in wurtzite phase AlGaN/GaN heterostructure (HFETs). The properties of AlGaN/GaN HFETs at the higher ambient temperature and doping concentration are described and evaluated. It is shown that the saturation drain current and peak transconductance of the devices investigated decrease similarly with increased temperature with respect to their room temperature values. On the other hand, the higher acceptor and donor concentration are favourable for restraining the shifts of threshold voltage in the AlGaN/GaN HFET.en_US
dc.identifier.issn2222-2510en_US
dc.identifier.urihttps://dspace.univ-tlemcen.dz/handle/112/1639en_US
dc.language.isoenen_US
dc.publisherUniversity of Tlemcenen_US
dc.subjectAlGaN/GaN heterostructure field-effect transistorsen_US
dc.subjecthigh ambient temperaturesen_US
dc.subjectdonor concentrationen_US
dc.subjectacceptor concentrationen_US
dc.titleAlGaN/GaN Heterostructure Field-Effect Transistors (HFETs) Model Including Impact Ionization Ratesen_US
dc.typeArticleen_US

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